The synthesis of novel ester acetal polymers and their application for chemically amplified positive i-line photoresist

Liyuan Wang D.D.S.; Yongen Huo; Fanrong Kong

doi:10.1117/12.773577

3 April 2008 The synthesis of novel ester acetal polymers and their application for chemically amplified positive i-line photoresist

Liyuan Wang D.D.S., Yongen Huo, Fanrong Kong

Author Affiliations +

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69233R (2008) https://doi.org/10.1117/12.773577
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Novel ester acetal polymers can be synthesized by the reaction of common aromatic dicarboxylic acids with divinyl ether compound in the presence of organic solvent. These polymers have good solubility in commonly used solvents. The molecular weights of the acetal polymers are measured 6000 - 7000(Mn) with Mw/Mn of 1.5-2.5. The polymers show high thermal stability. The acidolytic reaction of the polymers undergoes rapidly at room temperature or at a little higher temperature. Making use of the acidolysis activity at room temperature of the acetal polymer, we can form new type of chemically amplified positive i-line photoresist with the main contents including phenolic resin, the acetal polymer and PAG(s-triazine). Clear pattern with resolution of 2-3&mgr;m was obtained in the lithographic experiment of the photoresist. The photosensitivity of the photoresist is below 50mj/cm2.

Citation Download Citation

Liyuan Wang D.D.S., Yongen Huo, and Fanrong Kong "The synthesis of novel ester acetal polymers and their application for chemically amplified positive i-line photoresist", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69233R (3 April 2008); https://doi.org/10.1117/12.773577

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