Reflection control for line features of multiple pitches at hyper NA

Michael Reilly; Michael Wagner; Warren Montgomery; Nick Pugliano; Stewart Robertson

doi:10.1117/12.772909

15 April 2008 Reflection control for line features of multiple pitches at hyper NA

Michael Reilly, Michael Wagner, Warren Montgomery, Nick Pugliano, Stewart Robertson

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69233X (2008) https://doi.org/10.1117/12.772909
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

This study combines simulation and experiment to compare the impact that changing BARC thickness around some nominal value has on the resist profile, on an underlying reflective surface. Process window and profile effects are an important part of understanding how a BARC interacts with the resist's parameters to affect the latitude in the light of imperfect reflection control. Reflectivity simulations are made using MATLAB(r); and Prolith^TM that show the effect of choosing refractive index and thickness in a multi-layer bottom anti-reflecting coating (BARC). Trends are identified for the better operating values for the index as well as specific values that meet the criterion for organic BARC in a front end application on a reflective substrate. Experimental profiles are compared to simulation using a calibrated resist model for nominal, better and ideal BARC stacks. Reflectivity, as a function of angle in resist, is convolved with the diffraction intensity distribution. This reflection, determined by a pitch's diffraction angle, identifies what can become problematic in setting up a process. Depolarization causes are discussed and while their impact affects image formation, there is little difference in reflection.

Citation Download Citation

Michael Reilly, Michael Wagner, Warren Montgomery, Nick Pugliano, and Stewart Robertson "Reflection control for line features of multiple pitches at hyper NA", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69233X (15 April 2008); https://doi.org/10.1117/12.772909

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