Impact of optimization conditions on the result at optimizing illumination and mask

Koichiro Tsujita; Koji Mikami; Hiroyuki Ishii; Akiyoshi Suzuki

doi:10.1117/12.771369

7 March 2008 Impact of optimization conditions on the result at optimizing illumination and mask

Koichiro Tsujita, Koji Mikami, Hiroyuki Ishii, Akiyoshi Suzuki

Proceedings Volume 6924, Optical Microlithography XXI; 69242U (2008) https://doi.org/10.1117/12.771369
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Illumination for SRAM device pattern with peripheral circuit is optimized applying OPC during optimization. At first the memory cell is targeted, next library patterns that represent the peripheral circuit are added as the targets one by one, and it is investigated how the optimized illumination varies. As optimized targets ILS and dose-focus window are used. For the case of ILS the optimized illumination shapes become milder as more patterns are evaluated and the OPC result becomes weaker correspondingly. For the case of window the tendency is similar but not so intense. The illuminations optimized by ILS and window are different. The optimized illuminations by optical and resist simulation are a little different. As practical application illumination defined by functions such as annular is evaluated, where the information of actual scanners are applied. At first 1/4 divided polarization plate is used instead of tangential polarization. Secondly illumination is searched in the solution space that consists of hardware design instead of numerical expression. By introducing the information the optimized illuminations are varied. From these results it turns out that the optimization tool should handle the information of actual scanners properly. And we have developed the solution tool (k1-TUNE).

Citation Download Citation

Koichiro Tsujita, Koji Mikami, Hiroyuki Ishii, and Akiyoshi Suzuki "Impact of optimization conditions on the result at optimizing illumination and mask", Proc. SPIE 6924, Optical Microlithography XXI, 69242U (7 March 2008); https://doi.org/10.1117/12.771369

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
12 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Optical proximity correction

Polarization

Optical simulations

Scanners

Optimization (mathematics)

Photomasks

Computer simulations

Show All Keywords

Keywords/Phrases

Search In:

Publication Years