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17 March 2008 Evaluation of OPC test patterns using parameter sensitivity
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Abstract
Test pattern data set filtering based on the concept of parameter sensitivity is proposed to reduce OPC time-to-model requirements. The concept of parameter sensitivity-based filtering is discussed briefly, followed by a methodology to apply the filtering to test pattern sets prior to data measurement along with a number of potential data filtering algorithms. The proposed methodology is then applied to an experimental data set targeted for a 32nm logic process. Qualitative observations are made on the initial data filtering, followed by quantitative metrics based on best-fit models for each of the data filtering algorithms. Results demonstrate that a comparable model is achievable using the proposed data filtering methods and one of the filtering algorithms.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Brian S. Ward "Evaluation of OPC test patterns using parameter sensitivity", Proc. SPIE 6924, Optical Microlithography XXI, 69243S (17 March 2008); https://doi.org/10.1117/12.774462
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