Multi-patterning overlay control

C. P. Ausschnitt; P. Dasari

doi:10.1117/12.772865

17 March 2008 Multi-patterning overlay control

C. P. Ausschnitt, P. Dasari

Author Affiliations +

Proceedings Volume 6924, Optical Microlithography XXI; 692448 (2008) https://doi.org/10.1117/12.772865
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

The extension of optical lithography to 32nm and beyond is dependent on double-patterning (DP) at critical levels. DP integration strategies result in added degrees of freedom for overlay variation. In particular, overlay control requires assessment of error among various mask/level combinations. The Blossom overlay metrology approach minimizes the size of the overlay marks associated with each mask/level while maximizing the density of marks within the overlay metrology tool's field of view (FOV). We examine Blossom enabled use cases in DP lithography control; specifically, within-field and multiple mask/level sampling.

Citation Download Citation

C. P. Ausschnitt and P. Dasari "Multi-patterning overlay control", Proc. SPIE 6924, Optical Microlithography XXI, 692448 (17 March 2008); https://doi.org/10.1117/12.772865

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