DfM lessons learned from altPSM design

Lars Liebmann; Zak Baum; Ioana Graur; Don Samuels

doi:10.1117/12.771974

4 March 2008 DfM lessons learned from altPSM design

Lars Liebmann, Zak Baum, Ioana Graur, Don Samuels

Author Affiliations +

Proceedings Volume 6925, Design for Manufacturability through Design-Process Integration II; 69250C (2008) https://doi.org/10.1117/12.771974
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

The design challenges associated with alternating phase shifted mask lithography are discussed, solutions which had been developed to address these challenges are reviewed, and parallels to current design for manufacturability implementation issues are identified. Leveraging these insights, the positive attributes of a well integrated design for manufacturability enhanced design flow are proposed. Specific topics covered in the paper are: the need to complement error-detection with streamlined layout-correction, the risk of providing too much unstable information too early in the design optimization flow, the efficiencies of prescriptive 'correct-by-construction' solutions, and the need for seamless integration into existing design flows. For the benefit of the non-lithographer, the discussion of these detailed topics is preceded by a brief review of alternating phase shifted mask lithography principles and benefits.

Citation Download Citation

Lars Liebmann, Zak Baum, Ioana Graur, and Don Samuels "DfM lessons learned from altPSM design", Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69250C (4 March 2008); https://doi.org/10.1117/12.771974

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