Etching of chalcogenide glass for IR microoptics

John G. Smith; Gregg T. Borek

doi:10.1117/12.778748

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15 April 2008 Etching of chalcogenide glass for IR microoptics

John G. Smith, Gregg T. Borek

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Proceedings Volume 6940, Infrared Technology and Applications XXXIV; 69400W (2008) https://doi.org/10.1117/12.778748
Event: SPIE Defense and Security Symposium, 2008, Orlando, Florida, United States

Abstract

Manufacturing processes have been developed to produce wafer scale optics in chalcogenide glass using semiconductor fabrication. Chalcogenide materials are amorphous and covalently bonded solids containing one or more of elements in Group VI in the periodic table, e.g. sulphur, selenium, or tellurium as a substantial constituent. For this paper, the material selected for testing to determine the etching process was IG6 - As₄₀Se₆₀. Grayscale photolithography and binary methods were used to pattern diffractive elements for use in infrared applications. Dual-band color correction, incorporating diffractive optics, will be presented in the paper as an application of this development.

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John G. Smith and Gregg T. Borek "Etching of chalcogenide glass for IR microoptics", Proc. SPIE 6940, Infrared Technology and Applications XXXIV, 69400W (15 April 2008); https://doi.org/10.1117/12.778748

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