Paper
11 March 2008 Annealing effects on exciton localization in GaNAs/GaAs epilayer
Z. L. Liu, P. P. Chen, L. L. Ma, C. Wang, J. Shao, X. S. Chen, W. Lu
Author Affiliations +
Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69840Z (2008) https://doi.org/10.1117/12.792370
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China
Abstract
Rapid thermal annealing effects on GaNAs/GaAs epilayer with about 1.0% N are experimentally analyzed. Both the as-grown and annealed samples are studied by photoluminescence at different temperature (11K~290K). Exciton localization and delocalization are investigated in detail. It exhibits quite different optical properties for the localized and delocalized excitons before and after annealing, this is attributed to the nitrogen reorganization inside the GaNAs layer, which homogenizes initial nitrogen composition fluctuations present in the as-grown alloy.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Z. L. Liu, P. P. Chen, L. L. Ma, C. Wang, J. Shao, X. S. Chen, and W. Lu "Annealing effects on exciton localization in GaNAs/GaAs epilayer", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69840Z (11 March 2008); https://doi.org/10.1117/12.792370
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KEYWORDS
Excitons

Nitrogen

Annealing

Gallium arsenide

Luminescence

Optical properties

Thermal effects

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