Study of Si/SiO2 hybrid antireflective coatings on SLD prepared by DSEBET

M. X. Sun; M. Q. Tan; M. Zhao

doi:10.1117/12.792269

11 March 2008 Study of Si/SiO₂ hybrid antireflective coatings on SLD prepared by DSEBET

M. X. Sun, M. Q. Tan, M. Zhao

Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69842P (2008) https://doi.org/10.1117/12.792269
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China

Abstract

We introduce a double source electron beam evaporation (DSEBET) technique in this paper. The refractive index coatings were fabricated on K9 glass substrate by adjusting the evaporation rates of two independent sources. The coatings, which were described by atomic force microscopy (AFM), show good compactness and homogeneity. The antireflective (AR) coatings were fabricated on Superluminescent Diodes (SLD) by DSEBET. The hybrid AR coatings on the facets of SLD were prepared in evaporation rates of 0.22nm/s and 0.75nm/s for silicon and silicon dioxide, respectively. The results of AFM and spectral performance of coated SLD show that DSEBET has a promising future in preparing the coatings on optoelectronic devices.

Citation Download Citation

M. X. Sun, M. Q. Tan, and M. Zhao "Study of Si/SiO₂ hybrid antireflective coatings on SLD prepared by DSEBET", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842P (11 March 2008); https://doi.org/10.1117/12.792269

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