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15 May 2008 Direct patterning of micro-optical structures by combined nanoimprinting and lithography
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Abstract
The driving force behind combining the nanoimprinting and photolithography is to effectively utilize the advantages of both patterning techniques simultaneously. Conventional shadow-mask UV-lithography can be used to pattern micron-scale structures uniformly over large areas, whereas nanoimprinting enables patterning of nanoscale features, which can also be tilted or round-shaped. We present the work on direct patterning of micro-optical structures by combined nanoimprinting and lithography using modified mask aligner, hybrid mask mold and directly patternable, UV-curable materials. Patterning of structures is carried out in wafer-level fashion. Hybrid mask mold fabrication can be realized for example by modifying conventional shadow-mask using focused ion beam (FIB) milling, or by patterning a mold area on shadow-mask surface by nanoimprinting. One of the advantages of proposed fabrication method is that there is no need for reactive ion etching (RIE) process steps. We present also near-field holography (NFH) as a method of grating mold fabrication. Fabricated micro-optical structures include directly patterned waveguides with light coupling gratings, and also pyramid-shaped gratings which show antireflection properties in the mid-infrared spectral region.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jarkko Tuominen, Jussi Hiltunen, Antoine Wojdyla, Mikko Karppinen, Antti Suutala, Heli Jantunen, Renaud Bouffaron, and Ludovic Escoubas "Direct patterning of micro-optical structures by combined nanoimprinting and lithography", Proc. SPIE 6992, Micro-Optics 2008, 69920B (15 May 2008); https://doi.org/10.1117/12.781151
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