Translator Disclaimer
Paper
25 April 2008 Technology development for micromirror arrays with high optical fill factor and stable analogue deflection integrated on CMOS substrates
Author Affiliations +
Abstract
At Fraunhofer IPMS Dresden micromechanical mirror arrays are developed and fabricated using a high-voltage CMOS process for applications such as lithographic mask writers and adaptive optics. Different approaches for the fabrication of micromechanical mirror arrays with up to 1 million analogue addressable pixels in a MEMS-on-CMOS technology are discussed: sacrificial layer technologies of 1-level actuators made from a single Al-TiAl-Al structural multilayer or 2-level actuators with an additional TiAl hinge layer respectively. Also the fabrication of single crystalline Si micro-mirrors using layer-transfer bonding is discussed.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan-Uwe Schmidt, Martin Friedrichs, Thor Bakke, Benjamin Voelker, Dirk Rudloff, and Hubert Lakner "Technology development for micromirror arrays with high optical fill factor and stable analogue deflection integrated on CMOS substrates", Proc. SPIE 6993, MEMS, MOEMS, and Micromachining III, 69930D (25 April 2008); https://doi.org/10.1117/12.787015
PROCEEDINGS
7 PAGES


SHARE
Advertisement
Advertisement
Back to Top