Translator Disclaimer
Paper
29 April 2008 Nanorelief elements in reference measures for scanning electron microscopy
Author Affiliations +
Proceedings Volume 7025, Micro- and Nanoelectronics 2007; 702511 (2008) https://doi.org/10.1117/12.802428
Event: Micro- and Nanoelectronics 2007, 2007, Zvenigorod, Russian Federation
Abstract
The single elements of relief (protrusions and steps) fabricated by anisotropic etching of the surface of the silicon wafer congruent the crystallographic plane (100) in the scanning electron microscope have been studied. The image registration in the low energy secondary electron collection mode was carried out, and the influence of the probe electron energy and its diameter on the microscope signal formation by relief elements scanning was studied. The electron beam energy varied at the range of 0.3 - 20 keV, the probe diameter changed in the limits of 14 - 500 nm. The widths of upper bases of protrusions varied within 14 - 500 nm. The correlation analysis of experimental results, carried out by the authors, demonstrate high quality of the structures studied.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yu. A. Novikov, S. A. Darznek, M. N. Filippov, V. B. Mityukhlyaev, A. V. Rakov, and P. A. Todua "Nanorelief elements in reference measures for scanning electron microscopy", Proc. SPIE 7025, Micro- and Nanoelectronics 2007, 702511 (29 April 2008); https://doi.org/10.1117/12.802428
PROCEEDINGS
10 PAGES


SHARE
Advertisement
Advertisement
Back to Top