Multi column cell (MCC) e-beam exposure system for mask writing

Hiroshi Yasuda; Akio Yamada; Masaki Yamabe

doi:10.1117/12.793019

19 May 2008 Multi column cell (MCC) e-beam exposure system for mask writing

Hiroshi Yasuda, Akio Yamada, Masaki Yamabe

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 70280B (2008) https://doi.org/10.1117/12.793019
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

Association of Super-Advanced Electronics Technologies (ASET) Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) started a 4-year development program for the total optimization of mask design, drawing, and inspection technologies to reduce photomask manufacturing costs in 2006. At the Mask Writing Equipment Technology Research Laboratory, we are developing an e-beam exposure system introducing concepts of MCC (multi column cell), CP (character projection), and VSB (variable shaped beam), which has several times higher throughput than currently commercially available e-beam writing systems.

Citation Download Citation

Hiroshi Yasuda, Akio Yamada, and Masaki Yamabe "Multi column cell (MCC) e-beam exposure system for mask writing", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70280B (19 May 2008); https://doi.org/10.1117/12.793019

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