Translator Disclaimer
19 May 2008 Selete EUV reticle shipping and storage test results
Author Affiliations +
Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 70280I (2008)
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan
To protect the reticle during shipping and storage, several reticle pod concepts have been proposed and evaluated in the last 10 years. MIRAI-Selete has been developing EUV reticle handling technology and evaluating EUV reticle pods for two years. In this paper, we report results of shipping tests and storage tests using CNE pods; the CNE pod is designed by Entegris using "Dual Pod Concept" which Canon and Nikon jointly proposed in 2004. The pod consists of an inner pod and an outer pod. The inner pod has two components, a baseplate and a cover; the base plate protects the reticle front surface and the cover protects the back surface from particle contamination in shipping, storage and loading to a reticle chuck in an exposure tool. The outer pod is a RSP-200 slightly modified to contain the inner pod in it. We carried out thirty shipping tests and several storage tests and found the CNE pods had very promising protecting performance during shipping and storage.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kazuya Ota, Mitsuaki Amemiya, Takao Taguchi, and Osamu Suga "Selete EUV reticle shipping and storage test results", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70280I (19 May 2008);


EUV mask particle adders during scanner exposure
Proceedings of SPIE (April 06 2015)
NXE pellicle offering a EUV pellicle solution to the...
Proceedings of SPIE (March 18 2016)
NXE pellicle: development update
Proceedings of SPIE (September 26 2016)
Back side photomask haze revisited
Proceedings of SPIE (December 11 2009)

Back to Top