Optimization of measuring conditions for templates of UV nano imprint lithography

Kouji Yoshida; Kouichirou Kojima; Makoto Abe; Shiho Sasaki; Masaaki Kurihara; Yasutaka Morikawa; Hiroshi Mohri; Naoya Hayashi

doi:10.1117/12.793072

19 May 2008 Optimization of measuring conditions for templates of UV nano imprint lithography

Kouji Yoshida, Kouichirou Kojima, Makoto Abe, Shiho Sasaki, Masaaki Kurihara, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi

Author Affiliations +

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 70281V (2008) https://doi.org/10.1117/12.793072
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

Templates for UV-Nano-imprint lithography (NIL) have been rapidly improved these days. Feature sizes of the templates have come to be less than 30 nm. Consequently, metrology has been also one of the challenges to fabricate templates for UV-NIL. There are many issues in metrology for the templates; for instance, necessity of the higher resolution, critical dimension (CD) accuracy and repeatability for measurement tools. In this paper, we will focus on an optimization of measuring conditions for the templates of UV-NIL. And we will discuss some measuring techniques for CD precision and repeatability using a CD-SEM and a scanning probe microscope.

Citation Download Citation

Kouji Yoshida, Kouichirou Kojima, Makoto Abe, Shiho Sasaki, Masaaki Kurihara, Yasutaka Morikawa, Hiroshi Mohri, and Naoya Hayashi "Optimization of measuring conditions for templates of UV nano imprint lithography", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70281V (19 May 2008); https://doi.org/10.1117/12.793072

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