Registration measurement capability of VISTEC LMS IPRO4 with focus on small features

Christian Enkrich; Gunter Antesberger; Oliver Loeffler; Klaus-Dieter Roeth; Frank Laske; Karl-Heinrich Schmidt; Dieter Adam

doi:10.1117/12.793104

19 May 2008 Registration measurement capability of VISTEC LMS IPRO4 with focus on small features

Christian Enkrich, Gunter Antesberger, Oliver Loeffler, Klaus-Dieter Roeth, Frank Laske, Karl-Heinrich Schmidt, Dieter Adam

Author Affiliations +

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 70282Y (2008) https://doi.org/10.1117/12.793104
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

The development of the 45-nm node manufacturing process at leading edge mask shops is nearly finished. In order to reach the required registration measurement performance with a precision to tolerance value of P/T=0.25, the measurement error may not exceed 1.2 nm according to ITRS roadmap. This requires the latest generation of registration measurement tools. In addition, the demand for measuring very small features increases - for standard pattern placement measurements, as well as special engineering tasks, e.g., the position measurement of single contact holes. In this work, the error of pattern placement measurement on an LMS IPRO4 is determined using an analysis of variance methodology (ANOVA). In addition we analyze the capability as a function of the critical dimension (CD) of the registration feature. The results are compared to the previous tool generation.

Citation Download Citation

Christian Enkrich, Gunter Antesberger, Oliver Loeffler, Klaus-Dieter Roeth, Frank Laske, Karl-Heinrich Schmidt, and Dieter Adam "Registration measurement capability of VISTEC LMS IPRO4 with focus on small features", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282Y (19 May 2008); https://doi.org/10.1117/12.793104

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