An extraction of repeating patterns from OPCed layout data

Fujimoto Yoshihiro; Masahiro Shoji; Kokoro Kato; Tadao Inoue; Masaki Yamabe

doi:10.1117/12.793113

19 May 2008 An extraction of repeating patterns from OPCed layout data

Fujimoto Yoshihiro, Masahiro Shoji, Kokoro Kato, Tadao Inoue, Masaki Yamabe

Author Affiliations +

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 702836 (2008) https://doi.org/10.1117/12.793113
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

As the feature size of LSI becomes smaller, the increase of mask manufacturing cost is becoming critical. Association of Super-Advanced Electronics Technologies (ASET) started a 4-year project aiming at the reduction of mask manufacturing cost and TAT by the optimization of MDP, mask writing, and mask inspection in 2006 under the sponsorship of New Energy and Industrial Technology Development Organization (NEDO). In the project, the optimization is being pursued from the viewpoints of "common data format", "pattern prioritization", "repeating patterns", and "parallel processing" in MDP, mask writing, and mask inspection. In the total optimization, "repeating patterns" are applied to the mask writing using character projection (CP) and efficient review in mask inspection. In this paper, we describe a new method to find repeating patterns from OPCed layout data after fracturing. We found that using the new method efficient extraction of repeating patterns even from OPCed layout data is possible and shot count of mask writing decreases greatly.

Citation Download Citation

Fujimoto Yoshihiro, Masahiro Shoji, Kokoro Kato, Tadao Inoue, and Masaki Yamabe "An extraction of repeating patterns from OPCed layout data", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 702836 (19 May 2008); https://doi.org/10.1117/12.793113

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