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9 September 2008 UV lithographic patterning on spin-coated DNA thin-films
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Photopatterning with 266 nm UV light was accomplished on spin-coated DNA thin films using two different techniques. Lithographic masks were used to create 10-100 micron-sized arrays of enhanced hydrophilicity. Two such masks were used: (1) Polka Dot Filter having opaque squares and a transparent grid and (2) A metal wire-mesh having transparent squares and opaque grid. UV light selectively photodissociates the DNA film where it is exposed into smaller more hydrophilic fragments. UV-exposed films are then coated with a solution of a protein. The protein appears to selectively coat over areas exposed to UV light. We have also used interferometric lithography with UV light to accomplish patterning on the scale of 1 micron on DNA thin films. This technique has the potential to generate micro/nano arrays and vary the array-size. This paper describes the fabrication of these microarrays and a plausible application for fabricating antibody arrays for protein sensing applications.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Darnell E. Diggs, James G. Grote, Carrie Bartsch, Fahima Ouchen, Anup Sharma, J. M. Taguenang, Aschalew Kassu, and Redahegn Sileshi "UV lithographic patterning on spin-coated DNA thin-films", Proc. SPIE 7040, Nanobiosystems: Processing, Characterization, and Applications, 70400E (9 September 2008);

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