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28 August 2008 AFM of self-organised nanoparticle arrays: frequency modulation, amplitude modulation, and force spectroscopy
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Abstract
Frequency modulation (FM) and amplitude modulation (AM) atomic force microscopy have been used to image self-organised assemblies of octanethiol-passivated Au nanoparticles adsorbed on SiO2/Si(111) samples (where the oxide is either 200 nm or ~ 2 nm thick). Imaging at negative frequency shifts - i.e. in the attractive force regime - in FM mode in ultrahigh vacuum we measure nanoparticle heights which are over 50 % larger than those measured using conventional ("repulsive mode") tapping mode imaging in air. A similar difference in nanoparticle height is observed for attractive mode imaging in air. For nanoparticles adsorbed on 200 nm thick oxide layers, force-distance (F(z)) spectra (measured in FM mode) comprise both a van der Waals component with the conventional power law (1/z2) dependence and a strong electrostatic force which is best fitted using a logarithmic function of the form ln(1/z).
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Adam Sweetman, Peter Sharp, Andrew Stannard, Subhashis Gangopadhyay, and Philip J. Moriarty "AFM of self-organised nanoparticle arrays: frequency modulation, amplitude modulation, and force spectroscopy", Proc. SPIE 7041, Nanostructured Thin Films, 704102 (28 August 2008); https://doi.org/10.1117/12.796403
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