Antireflective trilayer films fabricated using a filtered cathodic vacuum arc

Nemo Biluš Abaffy; Jim G. Partridge; Dougal G. McCulloch

doi:10.1117/12.795634

10 September 2008 Antireflective trilayer films fabricated using a filtered cathodic vacuum arc

Nemo Biluš Abaffy, Jim G. Partridge, Dougal G. McCulloch

Proceedings Volume 7045, Photovoltaic Cell and Module Technologies II; 704508 (2008) https://doi.org/10.1117/12.795634
Event: Solar Energy + Applications, 2008, San Diego, California, United States

Abstract

A Filtered Cathodic Vacuum Arc (FCVA) thin film deposition system has been used to create Al₂O₃/Al/Al₂O₃ trilayer antireflection coatings on silicon. X-ray photoelectron spectroscopy was used to verify the stoichiometry of the deposited alumina. The optical properties of the deposited Al₂O₃ and Al have been examined using variable angle spectroscopic ellipsometry. The complex refractive index functions of the antireflection coating components were determined. Optical thin film software was used to optimise the required thicknesses of each of the layers in order to achieve minimum perpendicular reflection on silicon across the optical spectrum. The simulations showed that the thickness of the Al layer was critical and the required layer thickness was less than 10 nm. Antireflection coatings with various Al layer thicknesses were deposited and characterised. The microstructure of the coatings was examined, in detail, using cross sectional transmission electron microscopy. Reflectance measurements on the deposited coatings were also performed, with the optimised antireflection coating (with an Al layer thickness of 6 nm) achieving an average reflectance of 4% on silicon over the optical spectrum. The FCVA deposited trilayers are mechanically robust, easy to fabricate and exhibit high performance.

Citation Download Citation

Nemo Biluš Abaffy, Jim G. Partridge, and Dougal G. McCulloch "Antireflective trilayer films fabricated using a filtered cathodic vacuum arc", Proc. SPIE 7045, Photovoltaic Cell and Module Technologies II, 704508 (10 September 2008); https://doi.org/10.1117/12.795634

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