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29 August 2008 Integrated optics based on plasma processed dielectric materials
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Abstract
A first generation of dielectric rib waveguides has been designed and shaped to support a monomode confinement by using organosilicon materials elaborated by plasma enhanced chemical vapor deposition (PECVD). Optical losses have been measured around 5.5dB.cm-1 and 11.5dB.cm-1 for TE00 and TM00 modes, respectively. Then, synthesis of titanium dioxide thin films by PECVD has been investigated to improve optical and propagation properties. The first results on these films exhibit a refractive index around 1.99 at a 633 nm wavelength with a 380 nm optical gap. When an rf bias is applied to the substrate, the refractive index reaches 2.36, from -5V, without significant optical gap variation.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
T. Begou, B. Bêche, J. P. Landesman, E. Gaviot, A. Soussou, K. Makaoui, M. P. Besland, A. Granier, and A. Goullet "Integrated optics based on plasma processed dielectric materials", Proc. SPIE 7067, Advances in Thin-Film Coatings for Optical Applications V, 706705 (29 August 2008); https://doi.org/10.1117/12.793690
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