EUV polarimetry with single multilayer optical element

Sara Zuccon; Maria-Guglielmina Pelizzo; P. Nicolosi; A. Giglia; N. Mahne; S. Nannarone

doi:10.1117/12.791907

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3 September 2008 EUV Polarimetry with single multilayer optical element

Sara Zuccon, Maria-Guglielmina Pelizzo, P. Nicolosi, A. Giglia, N. Mahne, S. Nannarone

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Proceedings Volume 7077, Advances in X-Ray/EUV Optics and Components III; 70771R (2008) https://doi.org/10.1117/12.791907
Event: Optical Engineering + Applications, 2008, San Diego, California, United States

Abstract

A polarimetric measurement technique based on the analysis of the reflection data given by a single mirror rotated around the incidence beam axis is presented. In the extreme ultraviolet spectral region, a multilayer coated mirror must be used. The multilayer mirror must be fully characterized before the experiment. Theory demonstrates how this method allows complete determination of Stoke's parameters in case of a totally polarized beam. A simulation code has been developed in order to model the experiment in case of synchrotron radiation propagating in a bending magnet beamline and impinging a multilayer mirror. The simulation is useful to verify each time the effectiveness of the method in the different experimental conditions considered. Finally an experimental application is presented.

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Sara Zuccon, Maria-Guglielmina Pelizzo, P. Nicolosi, A. Giglia, N. Mahne, and S. Nannarone "EUV Polarimetry with single multilayer optical element", Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 70771R (3 September 2008); https://doi.org/10.1117/12.791907

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