Investigations of reactively sputtered TiO2-delta films for microbolometer applications

Myung-Ho Kwon; Keedong Yang; Yong-Su Park; Young-Ho Kim; Han Chung

doi:10.1117/12.800023

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2 October 2008 Investigations of reactively sputtered TiO_2-δ films for microbolometer applications

Myung-Ho Kwon, Keedong Yang, Yong-Su Park, Young-Ho Kim, Han Chung

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Proceedings Volume 7113, Electro-Optical and Infrared Systems: Technology and Applications V; 711306 (2008) https://doi.org/10.1117/12.800023
Event: SPIE Security + Defence, 2008, Cardiff, Wales, United Kingdom

Abstract

Heat-sensitive material is one of the most essential parts of microbolometer fabrication. Vanadium oxide (VO_x) and amorphous silicon (a-Si) are widely accepted materials for commercialized focal plane arrays. Meanwhile, there are a lot of efforts for finding alternative materials having better performance, lower process cost and higher yield. In this study, reactively sputtered titanium oxide (TiO_2-δ) films were investigated for heat sensitive material. Microbolometer device was also fabricated by using the TiO_2-δ film as a heat sensitive material. It is well known that the TiO_2-δ can have several phases according to film deposition condition. Properties of TiO_2-δ film could be largely varied by controlling the deposition condition. Resistivity of the fabricated TiO_2-δ film was ranged from 10^-2 Ω•cm to 10 Ω•cm. Negative TCR(temperature coefficient of resistance) value up to 2.8 %/K was obtained. 1/f noise of the TiO_2-δ film was comparable to that of VOx film. From the fabrication result of microbolometer device, feasibility of the reactively sputtered TiO_2-δ film was demonstrated. NETD(Noise equivalent temperature difference) of the 50μm-pitch simple single-level membrane structure microbolometer was 34mK with conditions of 1V bias and 30Hz operation frequency.

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Myung-Ho Kwon, Keedong Yang, Yong-Su Park, Young-Ho Kim, and Han Chung "Investigations of reactively sputtered TiO_2-δ films for microbolometer applications", Proc. SPIE 7113, Electro-Optical and Infrared Systems: Technology and Applications V, 711306 (2 October 2008); https://doi.org/10.1117/12.800023

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