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21 October 2008 Calibration and rotational contribution in third-order NLO properties characterization
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Abstract
Nonlinear index of refraction n2 of a series of organic solvents was measured by the nonlinear imaging (z-scan) technique. The results were compared with the values derived from the optical third harmonic generation (THG) done at the same (1064.2 nm) wavelength. The systematic differences between the values obtained from the z-scan measurements and from THG are attributed to mainly two factors: rotational contribution to n2 in z-scan measurements, where one measures the light induced birefringence and to the difference in dispersion for n2 derived from Kerr susceptibilities with respect to those derived from THG measurements. The difference is discussed in terms of a three level model for centrosymmetric structures. Applied to silica and benzene the model shows, at the measurements wavelength, a small difference between the two determinations in the case of silica and quite an important one in the case of benzene. A good agreement is observed for silica with the recently determined THG value.
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Ileana Rau, Francois Kajzar, Jerome Luc, Bouchta Sahraoui, and Georges Boudebs "Calibration and rotational contribution in third-order NLO properties characterization", Proc. SPIE 7118, Optical Materials in Defence Systems Technology V, 711809 (21 October 2008); https://doi.org/10.1117/12.800428
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