Lithography and design in partnership: a new roadmap

Andrew B. Kahng

doi:10.1117/12.813418

17 October 2008 Lithography and design in partnership: a new roadmap

Andrew B. Kahng

Proceedings Volume 7122, Photomask Technology 2008; 712202 (2008) https://doi.org/10.1117/12.813418
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

We discuss the notion of a 'shared technology roadmap' between lithography and design from several perspectives. First, we examine cultural gaps and other intrinsic barriers to a shared roadmap. Second, we discuss how lithography technology can change the design technology roadmap. Third, we discuss how design technology can change the lithography technology roadmap. We conclude with an example of the 'flavor' of technology roadmapping activity that can truly bridge lithography and design.

Citation Download Citation

Andrew B. Kahng "Lithography and design in partnership: a new roadmap", Proc. SPIE 7122, Photomask Technology 2008, 712202 (17 October 2008); https://doi.org/10.1117/12.813418

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