Lithography and design in partnership: a new roadmap

Andrew B. Kahng

doi:10.1117/12.813418

17 October 2008 Lithography and design in partnership: a new roadmap

Andrew B. Kahng

Author Affiliations +

Proceedings Volume 7122, Photomask Technology 2008; 712202 (2008) https://doi.org/10.1117/12.813418
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

We discuss the notion of a 'shared technology roadmap' between lithography and design from several perspectives. First, we examine cultural gaps and other intrinsic barriers to a shared roadmap. Second, we discuss how lithography technology can change the design technology roadmap. Third, we discuss how design technology can change the lithography technology roadmap. We conclude with an example of the 'flavor' of technology roadmapping activity that can truly bridge lithography and design.

Citation Download Citation

Andrew B. Kahng "Lithography and design in partnership: a new roadmap", Proc. SPIE 7122, Photomask Technology 2008, 712202 (17 October 2008); https://doi.org/10.1117/12.813418

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE