Process control of chrome dry etching by complete characterization of the RF power delivery

Björn Sass; Ralf Schubert; Thomas Jakubski; Sebastian Mauermann; Pavel Nesladek; Andreas Wiswesser; Karl-Heinz Gindra; Ray Malone

doi:10.1117/12.801080

17 October 2008 Process control of chrome dry etching by complete characterization of the RF power delivery

Björn Sass, Ralf Schubert, Thomas Jakubski, Sebastian Mauermann, Pavel Nesladek, Andreas Wiswesser, Karl-Heinz Gindra, Ray Malone

Author Affiliations +

Proceedings Volume 7122, Photomask Technology 2008; 71220E (2008) https://doi.org/10.1117/12.801080
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

In order to fulfil the upcoming requirements for photomasks there is a need for improving the process stability (reproducibility) of the unit processes in photomask fabrication. In order to understand and minimize the etch contribution to the CD stability impedance sensors integrated into the capacitively coupled radio frequency (RF) circuit (bias circuit) have shown a big potential. The last step towards a full characterization of the RF properties is the integration of impedance sensors in the inductively coupled RF circuit (source). This kind of sensor measures voltage, current and phase angle for the fundamental (13.56 MHz) and higher harmonics (up to the 5th harmonic). In this paper we are describing the integration of the Z-Scan sensors into the source RF matchbox and its impact on the RF and CD characteristics of the mask etcher. The central point is the correlation of impedance data to CD data. We will also compare the responses for bias and source impedance measurements.

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Björn Sass, Ralf Schubert, Thomas Jakubski, Sebastian Mauermann, Pavel Nesladek, Andreas Wiswesser, Karl-Heinz Gindra, and Ray Malone "Process control of chrome dry etching by complete characterization of the RF power delivery", Proc. SPIE 7122, Photomask Technology 2008, 71220E (17 October 2008); https://doi.org/10.1117/12.801080

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