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The use of MegaSonic energy is widely accepted in photomask cleaning. For the advanced technology nodes, beyond
65nm, the problem of damaged sub resolution assist features (SRAF) becomes highly prevalent. Such feature damages
are often related to the application of MegaSonic energy.
We investigated the influence of common cleaning media and MegaSonic parameters for damaging SRAF patterns. A
special option of our cleaning tool was utilized to test a large number of different settings with low resources for test
mask and defect inspections. In this paper we will present the results of our investigations and present conditions for
MegaSonic cleaning which will enable the wide use of this technology beyond the 45nm technology node.
Stefan Helbig,Sabine Urban,Elizabeth Klein, andSherjang Singh
"Impact of MegaSonic process conditions on PRE and sub-resolution assist feature damage", Proc. SPIE 7122, Photomask Technology 2008, 712210 (17 October 2008); https://doi.org/10.1117/12.801408
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Stefan Helbig, Sabine Urban, Elizabeth Klein, Sherjang Singh, "Impact of MegaSonic process conditions on PRE and sub-resolution assist feature damage," Proc. SPIE 7122, Photomask Technology 2008, 712210 (17 October 2008); https://doi.org/10.1117/12.801408