Benchmark of rigorous methods for electromagnetic field simulations

Sven Burger; Lin Zschiedrich; Frank Schmidt; Peter Evanschitzky; Andreas Erdmann

doi:10.1117/12.801248

17 October 2008 Benchmark of rigorous methods for electromagnetic field simulations

Sven Burger, Lin Zschiedrich, Frank Schmidt, Peter Evanschitzky, Andreas Erdmann

Author Affiliations +

Proceedings Volume 7122, Photomask Technology 2008; 71221S (2008) https://doi.org/10.1117/12.801248
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

We have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulations with the simulator Dr.LiTHO.With the combined tools we investigate the convergence of near-field and far-field results for different DUV masks. We also benchmark results obtained with the waveguide-method EMF solver included in Dr.LiTHO and with the finite-element-method EMF solver JCMsuite. We demonstrate results on convergence for dense and isolated hole arrays, for masks including diagonal structures, and for a large 3D mask pattern of lateral size 10 microns by 10 microns.

Citation Download Citation

Sven Burger, Lin Zschiedrich, Frank Schmidt, Peter Evanschitzky, and Andreas Erdmann "Benchmark of rigorous methods for electromagnetic field simulations", Proc. SPIE 7122, Photomask Technology 2008, 71221S (17 October 2008); https://doi.org/10.1117/12.801248

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