Fast and accurate hybrid subgrid and subcell finite-difference time-domain methods for the simulation of mask electromagnetic effects in sub-45nm lithography

Michael S. Yeung

doi:10.1117/12.801351

17 October 2008 Fast and accurate hybrid subgrid and subcell finite-difference time-domain methods for the simulation of mask electromagnetic effects in sub-45nm lithography

Michael S. Yeung

Author Affiliations +

Proceedings Volume 7122, Photomask Technology 2008; 71221T (2008) https://doi.org/10.1117/12.801351
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

Subgrid and subcell FDTD (S-FDTD) methods are described. They can be used for the fast and accurate simulation of mask electromagnetic effects in sub-45nm lithography. The accuracies of the S-FDTD methods are verified by comparison with FDTD and with a very accurate pseudospectral reference solution. The S-FDTD methods are an order of magnitude or more faster than FDTD. Furthermore, the S-FDTD methods require much less memory than FDTD for time marching. Hence, much larger mask areas can be simulated with S-FDTD than with FDTD.

Citation Download Citation

Michael S. Yeung "Fast and accurate hybrid subgrid and subcell finite-difference time-domain methods for the simulation of mask electromagnetic effects in sub-45nm lithography", Proc. SPIE 7122, Photomask Technology 2008, 71221T (17 October 2008); https://doi.org/10.1117/12.801351

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE