Design for manufacturability guideline development: integrated foundry approach

Hyesung Lee; Yeon-Ah Shim; Jae-Young Choi; Kwang-Seon Choi; Joanne Wu; Bo Su; Xinwei Zhou; Kenny Kim

doi:10.1117/12.801421

17 October 2008 Design for manufacturability guideline development: integrated foundry approach

Hyesung Lee, Yeon-Ah Shim, Jae-Young Choi, Kwang-Seon Choi, Joanne Wu, Bo Su, Xinwei Zhou, Kenny Kim

Author Affiliations +

Proceedings Volume 7122, Photomask Technology 2008; 712221 (2008) https://doi.org/10.1117/12.801421
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

It has been widely accepted that to ensure good yield in IC wafer manufacturing, early adaptation of DFM (Design for Manufacturability) guidelines in design phase is required and it is particularly true in Foundry business. Integrated foundry approaches for DFM guideline development were presented in this paper. With emphasis of process variations and process sensitivity impact on design patterns, we describe the procedure of the combination of rule-based and simulation-based lithographical hotspot pattern characterizations. An evaluation of process sensitivity metrics for analyzing potential pattern hotspots is then described. In addition, based on hotspot pattern severity, repeated patterns from different designs are saved into a pattern library as knowledge deposition tool and those patterns can be easily identified later in new designs through pattern search, which is much faster than simulation based hotspot detections. With this approach, a set of DFM compliance rules is derived to designs in the design implementation stage for both 110nm and 90nm technology nodes, striving to gain more yield, device performance, and improve time-to-volume production.

Citation Download Citation

Hyesung Lee, Yeon-Ah Shim, Jae-Young Choi, Kwang-Seon Choi, Joanne Wu, Bo Su, Xinwei Zhou, and Kenny Kim "Design for manufacturability guideline development: integrated foundry approach", Proc. SPIE 7122, Photomask Technology 2008, 712221 (17 October 2008); https://doi.org/10.1117/12.801421

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE