Signal analysis for the actinic full-field EUVL mask blank inspection system

Takeshi Yamane; Teruo Iwasaki; Toshihiko Tanaka; Tsuneo Terasawa; Osamu Suga; Toshihisa Tomie

doi:10.1117/12.801420

17 October 2008 Signal analysis for the actinic full-field EUVL mask blank inspection system

Takeshi Yamane, Teruo Iwasaki, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga, Toshihisa Tomie

Author Affiliations +

Proceedings Volume 7122, Photomask Technology 2008; 71222D (2008) https://doi.org/10.1117/12.801420
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

We have developed an actinic full-field inspection system to detect multilayer phase defect with dark field imaging. With this system, programmed phase defects on a mask blank were observed. The system can detect phase defects caused by a 1.5 nm high and 60 nm wide protrusion on a multilayer surface. Background intensity and signal to background ratio (SBR) of the observed defect images are analyzed with simulation. The background intensities were calculated with the model that it is generated by light scattered from mask surface roughness. The result indicates that the larger outer NA (numerical aperture) leads to an increase in the background intensity. In this correlation of NA with the background intensity, the calculation and experimental results correspond well. The defect images were simulated using the point spread function (PSF) of flare generated by mirror surface roughness employing Fourier technique. The SBRs of simulated defect images corresponded well with the SBRs of the observed images. These results support the calculation and simulation models are proper.

Citation Download Citation

Takeshi Yamane, Teruo Iwasaki, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga, and Toshihisa Tomie "Signal analysis for the actinic full-field EUVL mask blank inspection system", Proc. SPIE 7122, Photomask Technology 2008, 71222D (17 October 2008); https://doi.org/10.1117/12.801420

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