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17 October 2008 Study of EUVL mask defect repair using FIB-GAE method
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We evaluated a new FIB-GAE (Focused Ion Beam-Gas Assisted Etching) repairing process for the absorber defects on EUVL mask. XeF2 gas and H2O gas were used as etching assist agent and etching stop agent respectively. The H2O gas was used to oxidize Ta-nitride side-wall and to inactivate the remaining XeF2 gas after the completion of defect repair. At the Photomask Japan 2008 we had reported that side-etching of Ta-nitride caused CD degradation in EUVL. In the present paper we report on the performance of defect repair by FIB, and of printability using SFET (Small Field Exposure Tool). The samples evaluated, were in form of bridge defects in hp225nm L/S pattern. The cross sectional SEM images certified that the newly developed H2O gas process prevented side-etching damage to TaBN layer and made the side-wall close to vertical. The printability also showed excellent results. There were no significant CD changes in the defocus characterization of the defect repaired region. In its defect repair process, the FIB method showed no signs of scan damage on Cr buffered EUV mask. The repair accuracy and the application to narrow pitched pattern are also discussed.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Ryoji Hagiwara, and Anto Yasaka "Study of EUVL mask defect repair using FIB-GAE method", Proc. SPIE 7122, Photomask Technology 2008, 71222H (17 October 2008);


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