Development of a 1.5D reference comparator for position and straightness metrology on photomasks

J. Flügge; R. Köning; Ch. Weichert; W. Häßler-Grohne; R. D. Geckeler; A. Wiegmann; M. Schulz; C. Elster; H. Bosse

doi:10.1117/12.801251

17 October 2008 Development of a 1.5D reference comparator for position and straightness metrology on photomasks

J. Flügge, R. Köning, Ch. Weichert, W. Häßler-Grohne, R. D. Geckeler, A. Wiegmann, M. Schulz, C. Elster, H. Bosse

Proceedings Volume 7122, Photomask Technology 2008; 71222Y (2008) https://doi.org/10.1117/12.801251
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

The so-called Nanometer Comparator is the PTB vacuum length comparator which has been developed for high precision length metrology on measurement objects with micro- and nanostructured graduations, like e.g. line scales, incremental encoders or photomasks. The Nanometer Comparator allows to achieve smallest measurement uncertainties in the nm-range by use of vacuum laser interferometry for the displacement measurement. We will report on the achieved measurement performance of this high precision vacuum length comparator and the already started developments to substantially enhance its measurement capabilities by additional straightness measurement capabilities. The enhanced Nanometer Comparator will provide traceability for photomask pattern placement measurements in industry, also facing the challenges due to the increased requirements on registration metrology as set by the introduction of new lithography techniques like double patterning methods.

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J. Flügge, R. Köning, Ch. Weichert, W. Häßler-Grohne, R. D. Geckeler, A. Wiegmann, M. Schulz, C. Elster, and H. Bosse "Development of a 1.5D reference comparator for position and straightness metrology on photomasks", Proc. SPIE 7122, Photomask Technology 2008, 71222Y (17 October 2008); https://doi.org/10.1117/12.801251

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