Novel CD measurement and precise pattern size extraction method for optical images

Lev Faivishevsky

doi:10.1117/12.801434

17 October 2008 Novel CD measurement and precise pattern size extraction method for optical images

Lev Faivishevsky

Proceedings Volume 7122, Photomask Technology 2008; 71223C (2008) https://doi.org/10.1117/12.801434
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

A new method for accurate CD measurement and precise pattern size extraction from optical images is proposed. The approach is based on the underlying field theory of optical image generation. The method demonstrates superior precision compared with traditional edge detection schemes based on the image and not on the field nature of image creation. The proposed method presents accuracy parallel to that achieved by SEM imaging. Therefore it provides an alternative to electronic microscopy measurements in certain cases. This new method may be implemented for applications of accurate mask-CD measurement, as well as for retrieving the mask model from an optical image for a die to model application.

Citation Download Citation

Lev Faivishevsky "Novel CD measurement and precise pattern size extraction method for optical images", Proc. SPIE 7122, Photomask Technology 2008, 71223C (17 October 2008); https://doi.org/10.1117/12.801434

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