Mechanical properties investigation of PMMA, PC, and PS during thermal nanoimprinting

Dan Xie; Honghai Zhang; Sheng Liu; Fulong Zhu; Sheng Tao

doi:10.1117/12.819561

31 December 2008 Mechanical properties investigation of PMMA, PC, and PS during thermal nanoimprinting

Dan Xie, Honghai Zhang, Sheng Liu, Fulong Zhu, Sheng Tao

Proceedings Volume 7130, Fourth International Symposium on Precision Mechanical Measurements; 71300O (2008) https://doi.org/10.1117/12.819561
Event: Fourth International Symposium on Precision Mechanical Measurements, 2008, Anhui, China

Abstract

PMMA(Polymethylmetacrylate), PC(Polycarbonate) and PS(Polystyrene) are the most frequently used polymer resist for thermal nanoimprint lithography (T-NIL), and moreover they are suitable for optical devices according to their well-known high transparency and excellent optical performance. In present research, thermal and mechanical properties of these three polymers were investigated with the home-made six-axis micro-tester. From the data of test, it is found that temperature, pressure and embossing time demonstrate crucial effect on imprinting process. Whereafter, nano-gratings of PMMA, PC and PS which were imprinted by the home-made NIL prototype show finer pattern fidelity, uniformity and demoulding quality. Consequently, we believe that PMMA, PS and PC possess great potential to be manufactured as polymer-based MEMS and MOEMS devices by nanoimprinting directly apart from being photoresists for thermal-nanoimprint.

Citation Download Citation

Dan Xie, Honghai Zhang, Sheng Liu, Fulong Zhu, and Sheng Tao "Mechanical properties investigation of PMMA, PC, and PS during thermal nanoimprinting", Proc. SPIE 7130, Fourth International Symposium on Precision Mechanical Measurements, 71300O (31 December 2008); https://doi.org/10.1117/12.819561

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