Evaluation of high-repetition-rate excitation discharge in TEA gas laser with supersonic gas flow

Go Imada; Tran Thanh Son; Masataro Suzuki; Wataru Masuda

doi:10.1117/12.816453

17 April 2009 Evaluation of high-repetition-rate excitation discharge in TEA gas laser with supersonic gas flow

Go Imada, Tran Thanh Son, Masataro Suzuki, Wataru Masuda

Proceedings Volume 7131, XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 71310T (2009) https://doi.org/10.1117/12.816453
Event: XVII International Symposium on Gas Flow and Chemical Lasers and High Power Lasers, 2008, Lisboa, Portugal

Abstract

A double-pulse discharge method is used to simulate high-repetition-rate excitation discharge in TEA gas laser with supersonic gas flow. The supersonic gas flow is generated using a Ludwieg tube with a two-dimensional shock-free nozzle. A solid electrode with UV pins is used to generate the discharge. The test gas is a mixture of He and Ar (He:Ar = 9:1) with the density of 0.52 kg/m³ in a discharge cavity. In supersonic gas flow with the Mach number M = 2 (v = 860 m/s), not only gas density depression but also shock wave produced by the previous pulsed discharge has a key effect on stability of the subsequent discharge. For pulse repetition rate f = 60-25 kHz, the gas density depression has already been removed from the discharge cavity, whereas the traveling shock wave against the supersonic gas flow still remains. Hence the subsequent discharge becomes arc discharge. For f≤17 kHz, on the other hand, the subsequent discharge becomes glow discharge because both the shock waves and gas density depression have already been removed from the discharge cavity. A formula for estimating the maximum repetition rate of stable excitation discharge train in supersonic gas flow is proposed.

Citation Download Citation

Go Imada, Tran Thanh Son, Masataro Suzuki, and Wataru Masuda "Evaluation of high-repetition-rate excitation discharge in TEA gas laser with supersonic gas flow", Proc. SPIE 7131, XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 71310T (17 April 2009); https://doi.org/10.1117/12.816453

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KEYWORDS

Gas lasers

Electrodes

Ultraviolet radiation

Chromium

Laser systems engineering

Dielectrics

Argon

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