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21 April 2009 OFI argon excimer amplifier for intense subpicosecond VUV pulse generation
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Proceedings Volume 7131, XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 71311C (2009) https://doi.org/10.1117/12.820060
Event: XVII International Symposium on Gas Flow and Chemical Lasers and High Power Lasers, 2008, Lisboa, Portugal
Abstract
We have demonstrated an OFI Ar2* excimer VUV amplifier at 126 nm pumped by a high-intensity laser in the table top size. We observed the Ar2 * excimer emission centered at 126 nm with the spectral bandwidth of 10 nm (FWHM), which was produced in the OFI plasma. Significant amplification was observed inside the OFI Ar2 * excimer as a result of the optical feedback provided by a VUV reflector. The gain-length product of 5.6 was observed at the Ar pressure of 11 atm. The population inversion density on the order of 1017 cm-3 was evaluated inside the OFI plasma, which would be sufficient for the amplification of a subpicosecond VUV pulse at 126 nm produced by the harmonic generation.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Kaku, S. Kubodera, K. Oda, M. Katto, A. Yokotani, N. Miyanaga, and K. Mima "OFI argon excimer amplifier for intense subpicosecond VUV pulse generation", Proc. SPIE 7131, XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 71311C (21 April 2009); https://doi.org/10.1117/12.820060
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