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30 December 2008 Laser-based cleaning methods for optics and electronics
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Abstract
Contamination is a primary concern in the optics and electronics industry since it can lead to both reduced performance and premature failures. This work is concerned with evaluating the performance of laser based cleaning methods for removal of contaminants (dielectrics, metals) from the surface of optics. In general, the art of cleaning contaminants from surfaces is a balance between the energy used to remove the contaminant while minimizing the amount that is applied to the substrate. In this work we present our work with a dry, non-contact method of cleaning that is ideal for, but not limited to, delicate surfaces where traditional contact cleaning methods are not possible. The photo-absorption technique being explored utilizes the absorbed laser light in the surface to thermo-mechanically remove the particle from the substrate. In this work, the process of photo-absorption method will be discussed and the challenges associated with this cleaning method will be presented.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chad Y. Sheng, Robert R. Bousquet, and Robert A. Rashford "Laser-based cleaning methods for optics and electronics", Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71321N (30 December 2008); https://doi.org/10.1117/12.804334
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