Design and fabrication of visible/mid-infrared dual-band microfilter array

Huafeng Liang; Jianjun Lai; Zhiping Zhou; Li Li

doi:10.1117/12.803203

18 November 2008 Design and fabrication of visible/mid-infrared dual-band microfilter array

Huafeng Liang, Jianjun Lai, Zhiping Zhou, Li Li

Proceedings Volume 7135, Optoelectronic Materials and Devices III; 71350S (2008) https://doi.org/10.1117/12.803203
Event: Asia-Pacific Optical Communications, 2008, Hangzhou, China

Abstract

Integrated visible/infrared dual-band filter array is the key component of compact, lightweight, rigid miniature dual-band CCD sensing system. Interference cut-off filter array and interference absorbing filter array have been designed for infrared and visible pass band respectively. A simple, effective and compatible with high temperature deposition process lift-off technique for striping thick infrared film was investigated. Integrating photolithography, ion beam assisted electron beam physical vapor deposition and improved lift-off process, dual-band microfilter array with good performance was fabricated on the same sapphire substrate consecutively. Details of design and fabricating procedure are elucidated, and experimental results are presented.

Citation Download Citation

Huafeng Liang, Jianjun Lai, Zhiping Zhou, and Li Li "Design and fabrication of visible/mid-infrared dual-band microfilter array", Proc. SPIE 7135, Optoelectronic Materials and Devices III, 71350S (18 November 2008); https://doi.org/10.1117/12.803203

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