Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses

Tilmann Heil; Johannes Ruoff; Jens Timo Neumann; Michael Totzeck; Daniel Krähmer; Bernd Geh; Paul Gräupner

doi:10.1117/12.805438

4 December 2008 Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses

Tilmann Heil, Johannes Ruoff, Jens Timo Neumann, Michael Totzeck, Daniel Krähmer, Bernd Geh, Paul Gräupner

Author Affiliations +

Proceedings Volume 7140, Lithography Asia 2008; 714018 (2008) https://doi.org/10.1117/12.805438
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

We introduce the 'Orientation Zernike Polynomials', a base function representation of retardation and diattenuation which are most relevant for vector imaging. We show that the 'Orientation Zernike Polynomials' provide a complete and systematic description of vector imaging using high NA lithography lenses and, hence, a basis for an in depth understanding of both polarized and unpolarized imaging, and its modeling.

Citation Download Citation

Tilmann Heil, Johannes Ruoff, Jens Timo Neumann, Michael Totzeck, Daniel Krähmer, Bernd Geh, and Paul Gräupner "Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses", Proc. SPIE 7140, Lithography Asia 2008, 714018 (4 December 2008); https://doi.org/10.1117/12.805438

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