Paper
4 December 2008 Reactive liquid crystal materials for optically anisotropic patterned retarders
Richard Harding, Iain Gardiner, Hyun-Jin Yoon, Tara Perrett, Owain Parri, Karl Skjonnemand
Author Affiliations +
Proceedings Volume 7140, Lithography Asia 2008; 71402J (2008) https://doi.org/10.1117/12.805378
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan
Abstract
Merck has developed a range of reactive liquid crystal materials (Reactive Mesogens) that are designed to form thin, birefringent, coatable films for optical applications. Reactive Mesogen (RM) films are typically coated from solution and polymerized in-situ to form thin, optics-grade coatings. Merck RM materials are customized formulations including reactive liquid crystals, surfactants, photoinitiators and other proprietary additives. Merck have optimized the materials to achieve the optimum physical performance in each application. In this paper we focus on the optimization of RM materials to achieve the finest patterning resolution and defined feature shape whilst maintaining good physical properties of the films. Several conventional trade-offs are investigated and circumvented using novel material concepts. Different methods of patterning RM materials are discussed and the merits of each considered. Thermal annealing of non-polymerized regions can create isotropic islands within the polymerized anisotropic matrix. Alternatively, the non polymerized material can be re-dissolved in the coating solvent and rinsed away. Each of these techniques has benefits depending on the processing conditions and these are discussed in depth.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Richard Harding, Iain Gardiner, Hyun-Jin Yoon, Tara Perrett, Owain Parri, and Karl Skjonnemand "Reactive liquid crystal materials for optically anisotropic patterned retarders", Proc. SPIE 7140, Lithography Asia 2008, 71402J (4 December 2008); https://doi.org/10.1117/12.805378
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CITATIONS
Cited by 6 scholarly publications and 31 patents.
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KEYWORDS
Polymers

Optical lithography

Ultraviolet radiation

Polymer thin films

Liquid crystals

Photomasks

Polymerization

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