The first on-site evaluation of a new filter optimized for TARC and developer

Toru Umeda; Takeo Ishibashi; Atsushi Nakamura; Junichi Ide; Masaru Nagano; Koichi Omura; Shuichi Tsuzuki; Toru Numaguchi

doi:10.1117/12.804672

4 December 2008 The first on-site evaluation of a new filter optimized for TARC and developer

Toru Umeda, Takeo Ishibashi, Atsushi Nakamura, Junichi Ide, Masaru Nagano, Koichi Omura, Shuichi Tsuzuki, Toru Numaguchi

Author Affiliations +

Proceedings Volume 7140, Lithography Asia 2008; 71402Z (2008) https://doi.org/10.1117/12.804672
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

In previous studies, we identified filter properties that have a strong effect on microbubble formation on the downstream side of the filter membrane. A new Highly Asymmetric Polyarylsulfone (HAPAS) filter was developed based on the findings. In the current study, we evaluated newly-developed HAPAS filter in environmentally preferred non-PFOS TARC in a laboratory setting. Test results confirmed that microbubble counts downstream of the filter were lower than those of a conventional HDPE filter. Further testing in a manufacturing environment confirmed that HAPAS filtration of TARC at point of use was able to reduce defectivity caused by microbubbles on both unpatterned and patterned wafers, compared with a HDPE filter.

Citation Download Citation

Toru Umeda, Takeo Ishibashi, Atsushi Nakamura, Junichi Ide, Masaru Nagano, Koichi Omura, Shuichi Tsuzuki, and Toru Numaguchi "The first on-site evaluation of a new filter optimized for TARC and developer", Proc. SPIE 7140, Lithography Asia 2008, 71402Z (4 December 2008); https://doi.org/10.1117/12.804672

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