Fabrication of the linearly chirped phase mask for working in 248 nm wavelength

Quan Liu; Jianhong Wu; Weipeng Yang

doi:10.1117/12.806917

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9 February 2009 Fabrication of the linearly chirped phase mask for working in 248 nm wavelength

Quan Liu, Jianhong Wu, Weipeng Yang

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Proceedings Volume 7158, 2008 International Conference on Optical Instruments and Technology: Microelectronic and Optoelectronic Devices and Integration; 71580F (2009) https://doi.org/10.1117/12.806917
Event: International Conference of Optical Instrument and Technology, 2008, Beijing, China

Abstract

Using chirped phase mask to fabricate chirped fiber Bragg gratings (CFBG) is a very important method. In this paper, a linearly chirped phase mask with the period of 1000nm in the center, ruled area 100×10mm2 and 1nm/mm chirp rate has been fabricated by a new technique, which combines holographic-ion beam etching and reactive ion beam etching. This involves two main steps: formation of a grating mask by holographic interference exposure and development, and transferring it into the substrate to form a permanent phase mask by both ion beam etching and reactive ion beam etching. Experimental measurements show that the zero order diffraction efficiency is less than 2% and the plus and minus first-order diffraction efficiency is more than 35%; the nonlinear coefficient is 1.6%. Theoretical analysis also indicates that these phase masks can be used to fabricate the UV written CFBG.

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Quan Liu, Jianhong Wu, and Weipeng Yang "Fabrication of the linearly chirped phase mask for working in 248 nm wavelength", Proc. SPIE 7158, 2008 International Conference on Optical Instruments and Technology: Microelectronic and Optoelectronic Devices and Integration, 71580F (9 February 2009); https://doi.org/10.1117/12.806917

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