A high precision metrology method and system for thin film's parameters based on reflectance spectrum

Zhiyong Dai; Zengshou Peng; Zhonghua Ou; Yongzhi Liu; Lixun Zhang

doi:10.1117/12.807076

2 February 2009 A high precision metrology method and system for thin film's parameters based on reflectance spectrum

Zhiyong Dai, Zengshou Peng, Zhonghua Ou, Yongzhi Liu, Lixun Zhang

Proceedings Volume 7160, 2008 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Applications; 71602P (2009) https://doi.org/10.1117/12.807076
Event: International Conference of Optical Instrument and Technology, 2008, Beijing, China

Abstract

How to determine the parameters of thin film precisely and rapidly becomes more and more important. In this paper, a new method based on reflectance spectrum combining complex-shape method to determine multi parameters of thin film simultaneously by dwindling the polyhedron is first presented. On the one hand, this new method fix out the problem of multiple solutions well. On the other hand, for there is no dependence on interferential spectrum and transparent area, the method can be applied to diverse sorts of reflectance spectrum with a fast speed, nice convergence, and high precision. In the meantime, the metrology system based on this method is built up and measured experiment for standard thin film sample is implemented also. Comparing the measured results to the standard values of the standard thin film sample, the results show that the error degree is about ± 3%. The experimental results prove this method has a nice application value.

Citation Download Citation

Zhiyong Dai, Zengshou Peng, Zhonghua Ou, Yongzhi Liu, and Lixun Zhang "A high precision metrology method and system for thin film's parameters based on reflectance spectrum", Proc. SPIE 7160, 2008 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Applications, 71602P (2 February 2009); https://doi.org/10.1117/12.807076

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