Large-area plasmonic structures fabricated by laser nanopatterning and their applications

M. H. Hong; C. H. Liu; F. Ma; Z. C. Chen; B. Luk'yanchuk; L. P. Shi; T. C. Chong

doi:10.1117/12.810460

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24 February 2009 Large-area plasmonic structures fabricated by laser nanopatterning and their applications

M. H. Hong, C. H. Liu, F. Ma, Z. C. Chen, B. Luk'yanchuk, L. P. Shi, T. C. Chong

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Proceedings Volume 7202, Laser-based Micro- and Nanopackaging and Assembly III; 72020K (2009) https://doi.org/10.1117/12.810460
Event: SPIE LASE: Lasers and Applications in Science and Engineering, 2009, San Jose, California, United States

Abstract

Laser interference lithography is applied to fabricate large-area plasmonic nanostructures. This approach has the advantages of being non-contact process in air and able to achieve large-area and maskless nanolithography at a high speed with low system investment. Single layer Au or Ag noble metallic thin film and Ag/Au, Ag/Ni or Au/Ni bimetallic layer thin films are patterned into nano-dot, nano-rod and nano-nut arrays by laser interference lithography. Plasmonic effects of the fabricated metallic nanostructures are studied. Tunable and multi-peak surface plasmon resonances of these nanostructures can be obtained, which have potential applications in solar cells, bio-sensing and photonic circuits.

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M. H. Hong, C. H. Liu, F. Ma, Z. C. Chen, B. Luk'yanchuk, L. P. Shi, and T. C. Chong "Large-area plasmonic structures fabricated by laser nanopatterning and their applications", Proc. SPIE 7202, Laser-based Micro- and Nanopackaging and Assembly III, 72020K (24 February 2009); https://doi.org/10.1117/12.810460

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