An evaporative co-assembly method for highly ordered inverse opal films

Benjamin Hatton; Lidiya Mishchenko; Robert Norwood; Stan Davis; Kenneth Sandhage; Joanna Aizenberg

doi:10.1117/12.809656

23 February 2009 An evaporative co-assembly method for highly ordered inverse opal films

Benjamin Hatton, Lidiya Mishchenko, Robert Norwood, Stan Davis, Kenneth Sandhage, Joanna Aizenberg

Proceedings Volume 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II; 72050F (2009) https://doi.org/10.1117/12.809656
Event: SPIE MOEMS-MEMS: Micro- and Nanofabrication, 2009, San Jose, California, United States

Abstract

Colloidal self-assembly holds promise for photonic applications as a solution-based, low-cost alternative to top-down photolithography, if significant control of uniformity and defects can be achieved. Herein we demonstrate a new evaporative co-assembly method for highly-uniform inverse opal thin films that involves the self-assembly of polymer colloids in a solution containing a silicate precursor. Nanoporous inverse opal films can be made crack-free and with highly uniform orientation at the cm scale. The silicate between the colloids appears to increase the strength against cracking. This control of defects makes this method well-suited for the low cost fabrication of such films as sensors and photonic devices.

Citation Download Citation

Benjamin Hatton, Lidiya Mishchenko, Robert Norwood, Stan Davis, Kenneth Sandhage, and Joanna Aizenberg "An evaporative co-assembly method for highly ordered inverse opal films", Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 72050F (23 February 2009); https://doi.org/10.1117/12.809656

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