Annealing effect on optical barrier in ion-implanted tellurite glass waveguides

S. Berneschi; I. Cacciari; G. Nunzi Conti; S. Pelli; G. C. Righini; I. Bányász; N. Q. Khanh; T. Lohner; P. Petrik; Z. Zolnai; M. Bettinelli; A. Speghini; L. Mescia; F. Prudenzano

doi:10.1117/12.811153

9 February 2009 Annealing effect on optical barrier in ion-implanted tellurite glass waveguides

S. Berneschi, I. Cacciari, G. Nunzi Conti, S. Pelli, G. C. Righini, I. Bányász, N. Q. Khanh, T. Lohner, P. Petrik, Z. Zolnai, M. Bettinelli, A. Speghini, L. Mescia, F. Prudenzano

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Proceedings Volume 7218, Integrated Optics: Devices, Materials, and Technologies XIII; 721807 (2009) https://doi.org/10.1117/12.811153
Event: SPIE OPTO: Integrated Optoelectronic Devices, 2009, San Jose, California, United States

Abstract

Slab waveguides were fabricated in tellurite glasses by means of nitrogen ion implantation, using a wide range of ion doses (from 5x10¹² to 8x10¹⁶ ions/cm²), in order to investigate their effects on the induced refractive index change. The results of the characterization, carried out by means of dark-line spectroscopy, show the presence of an optical barrier with a decrease of the refractive index at the end of range. Annealing post-implantation process was performed at different temperatures on higher doses (≥10¹⁶ ions/cm²) ion implanted slab waveguides and the characterization showed a decrease of the barrier effect probably due to a corresponding reduction of the defects inside the glass matrix.

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S. Berneschi, I. Cacciari, G. Nunzi Conti, S. Pelli, G. C. Righini, I. Bányász, N. Q. Khanh, T. Lohner, P. Petrik, Z. Zolnai, M. Bettinelli, A. Speghini, L. Mescia, and F. Prudenzano "Annealing effect on optical barrier in ion-implanted tellurite glass waveguides", Proc. SPIE 7218, Integrated Optics: Devices, Materials, and Technologies XIII, 721807 (9 February 2009); https://doi.org/10.1117/12.811153

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