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10 February 2009 Design and fabrication of mode size adapter using hybrid imprint lithography
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Abstract
Mode size adapters that are needed to interconnect two planar waveguides of different sizes have been designed and fabricated by the imprinting lithography. Optimum dimensions of the adapters were determined by simulation. The input port of the mode size adapters has fixed cross section size of 10 μm wide and 7 μm height. From the simulation results, the output port should have the lowest optical loss at 5μm in height and 8μm in width. Molds for the imprint were prepared by noble hybrid imprint lithography which employed both imprinting and photolithography and fabrication of mode size adapters with smooth and sloped taper region was successfully demonstrated.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Se-Hwan Sim, Han-Hyong Kim, Seung-Kook Yang, Hai-Joong Park, Seong-Jong Kim, Beom-Hoan O, Seung-Gol Lee, El-Hang Lee, and Se-Geun Park "Design and fabrication of mode size adapter using hybrid imprint lithography", Proc. SPIE 7219, Optoelectronic Integrated Circuits XI, 72190X (10 February 2009); https://doi.org/10.1117/12.811958
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