Paper
17 March 2009 Coulomb blur advantage of a multi-shaped beam lithography approach
Matthias Slodowski, Hans-Joachim Doering, Thomas Elster, Ines A. Stolberg
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Abstract
This paper describes a new multi beam approach in electron beam lithography called Multi Shaped Beam (MSB). Based on the well known Variable Shaped Beam (VSB) principle, the single shaped beam arrangement is extended and complemented by an array of individually controlled shaped beams. The positive effect of the MSB approach on resolution limiting stochastic beam blur due to Coulomb interactions will be highlighted applying detailed electron-optical Monte-Carlo simulations. To verify the feasibility of the above-mentioned new approach, there is also depicted a proof-of-lithography test stand based on a complete e-beam-lithography system containing MSB-specific hardware and software components.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matthias Slodowski, Hans-Joachim Doering, Thomas Elster, and Ines A. Stolberg "Coulomb blur advantage of a multi-shaped beam lithography approach", Proc. SPIE 7271, Alternative Lithographic Technologies, 72710Q (17 March 2009); https://doi.org/10.1117/12.814113
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Beam shaping

Stochastic processes

Vestigial sideband modulation

Monte Carlo methods

Lithography

Electron beam lithography

Electron beams

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